Micro objective lens CFI60

for microscopyfor researchinspection

Overview
CFI60-2 objectives are evolved from the CFI60 series, combining high numerical aperture (NA) with extended working distance for industrial microscopy and inspection applications. Using Nikon's phase Fresnel lens (diffraction optical element), the CFI60-2 family delivers improved chromatic correction and long working distances across a wide magnification range.

CFI60-2 — Key models & ranges

• Magnifications: 1×, 2.5×, 5×, 10×, 20×, 50×, 100×, 150× (series-dependent).
• Numerical aperture (NA): approx. 0.03–0.95 depending on model.
• Working distance (WD): approx. 0.30–37.00 mm, including ELWD and SLWD variants for extended access.
• Optical types: Achromat, Semi-apochromat (Universal Plan Fluor / TU Plan Fluor), Apochromat (Plan Apo).
• Special variants: polarizing models, brightfield/darkfield (BD), long/super-long WD, and interferometry XA/TI objectives.

Notes (CFI60-2)
*1 Phase Fresnel lens (diffraction optical element).
*2 T Plan EPI 1×/2.5× models include a built-in circular polarising plate and depolariser; the circular polarising plate can be attached/detached.

CFI60 — Overview
CFI60 objectives are designed for Nikon's CFI60 optical standard (60 mm parfocal distance), increasing working distance while maintaining high NA for high-resolution, high-contrast imaging in industrial and research setups.

CF Infinity-corrected objectives — Overview
CF infinity-corrected objectives combine field-proven CF optics with infinity correction to minimize flare and provide high-resolution, high-contrast images. Series include standard, ELWD, SLWD and apochromat variants.

Technical characteristics / specifications

• Manufacturer / Brand: Nikon.
• Parfocal distance: 60 mm (CFI60 standard).
• Magnification range: 1×–150× (model dependent).
• Numerical aperture (NA): ~0.03–0.95.
• Working distance (WD): ~0.30–37.00 mm (includes ELWD/SLWD options).
• Optical elements: Phase Fresnel lens used in CFI60-2 for extended WD and chromatic correction.
• Special-purpose models: interferometry (DI/TI/XA), LCD-inspection with correction mechanism (CFI L Plan EPI CR), polarising variants.