Niobium sputtering target

molybdenum cathodic

Overview
Molybdenum‑niobium (MoNb) is used in touch panels as a corrosion‑resistant contact for ITO sensors. Plansee MoNb sputtering targets are produced within an integrated process from high‑purity metal powder to finished target. Plansee supplies planar and rotary targets in common industrial sizes.

Your advantages

• Purity: > 99.97%
• Relative density after sintering: > 98.5%
• Homogeneous microstructure and chemical composition

Manufacturing
Production follows powder metallurgy routes: controlled mixing of high‑purity metal powders, Nb content adjusted per application (up to 10 wt%), pressing, uniform densification in sintering equipment, forming into final geometry and in‑house finishing and bonding. Several patents protect Plansee's MoNb manufacturing processes.

Product variants / availability

• Planar (flat) targets and rotary/rotating (tubular) targets
• Niobium content selectable up to 10 wt%
• Available in all common industrial sizes (special sizes on request)

Related materials
Plansee also offers molybdenum‑tantalum (MoTa) and molybdenum‑tungsten (MoW) sputtering targets for highly corrosion‑resistant coatings.

Technical specifications

• Material system: Molybdenum (Mo) – Niobium (Nb) alloy (MoNb)
• Nb content: up to 10 wt% (application dependent)
• Purity: > 99.97%
• Relative density (after sintering): > 98.5%
• Microstructure: homogeneous, controlled
• Forms: planar and rotary/rotating targets
• Manufacturing: powder metallurgy — mixing, pressing, sintering, forming; in‑house finishing and bonding
• Applications: corrosion‑resistant contacts in ITO touch panels and other PVD coating applications