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Radial waveplate #3683
quartzfor linear polarization conversion

Radial waveplate - #3683 - Edmund Industrial Optics - quartz / for linear polarization conversion
Radial waveplate - #3683 - Edmund Industrial Optics - quartz / for linear polarization conversion
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radial, quartz, for linear polarization conversion

Description

Overview
Radial Polarization Converters (S-waveplates) are space-variant retarders inscribed in fused silica that convert linear polarization into radial or azimuthal polarization and convert circular polarization into optical vortices (donut-shaped beams). They are engineered for polarization control in laser-processing and optical-manipulation applications where reduced focal spot size or vortex beam profiles are required.

Key Features
  • Converts linear polarization to radial or azimuthal polarization
  • Converts circular polarization to an optical vortex (donut-shaped beam)
  • High damage thresholds compatible with nanosecond and femtosecond laser regimes
  • Higher-order versions available to generate increased topological charge and complex polarization patterns

Manufacturing
Devices are fabricated by femtosecond-laser inscription of self-organized nanogratings inside fused silica. This process produces space-variant retarders (S-waveplates) with precise local birefringence, optimized for high-damage-threshold laser operation and stable performance under high-intensity irradiation.

Applications
  • Micro-drilling and high-aspect-ratio micromachining of metals and dielectrics
  • STED microscopy and two-photon excitation fluorescence microscopy using vortex (donut-shaped) beams
  • Laser micromachining of transparent materials; when combined with axicons, higher-order converters can generate vector Bessel beams
  • Optical tweezers and multiple-particle trapping using tailored polarization and vortex beam profiles

Technical specifications
  • Type: Radial Polarization Converter (S-waveplate)
  • Function: Converts linear → radial/azimuthal polarization; circular → optical vortex
  • Substrate / Material: Fused silica (nanograting inscription)
  • Manufacturing method: Femtosecond-laser inscription of self-organized nanogratings in fused silica
  • Damage threshold: High; suitable for nano- and femtosecond laser regimes
  • Higher-order options: Available to generate higher-order polarization patterns and optical vortices (increased topological charge)
  • Compatibility: Can be combined with axicons to produce vector Bessel beams
  • Typical applications: Micromachining, STED and two-photon microscopy, optical tweezers, micro-drilling

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