Magnetron sputtering machine DXMS-450C

for metallization

The DXMS-450C Magnetron Sputtering Coating System is a laboratory PVD platform for producing nano- and micro-structured thin films (metals, semiconductors, dielectrics, oxides, nitrides). It allows single-target, sequential and dual-target co-sputtering and integrates vacuum, gas, power and control subsystems for R&D and small-scale production.

System composition

• Coating chamber: pear-shaped sputtering chamber, Φ450 mm × H460 mm, SUS304 stainless steel; top electric large flange cover.
• Magnetron interfaces: two 4-inch magnetron target ports on chamber baseplate; adjustable target heads; RF and DC compatible, water-cooled; single or dual target operation.
• Sample rack/substrate table and heater assembly.
• Working gas circuit: mass flow control for Ar and O2 plus N2 path; three gas channels enter via CF16 ultra-high vacuum valve.
• Power supply & control cabinets and vacuum system (turbomolecular + mechanical pump) with vacuum instrumentation.

Vacuum acquisition and measurement
The system uses a turbomolecular pump (FF-160/620, water-cooled) with an 8 L/s mechanical backing pump, achieving ultimate vacuum better than 8×10^-5 Pa. Vacuum is monitored by a digital composite vacuum gauge. Molecular pump port valve: GV150 manual gate valve.

Sample holder assembly

• Substrate table diameter: Φ150 mm — accepts one 2–6-inch substrate or multiple smaller substrates.
• Maximum substrate heating temperature: ≥500 ℃; heater constructed of oxidation-resistant material; selected temperature controller (Japanese brand).
• Substrate rotation: independent rotation, adjustable 2–10 rpm.
• One sample baffle supplied; negative bias available 0–200 V.

Magnetron targets & coating uniformity

• Two 4-inch water-cooled magnetron targets mounted on baseplate with adjustable angle; compatible with RF and DC; supports single or dual-target sputtering.
• Coating uniformity: within 5-inch effective area ≤ ±5%; within 2-inch effective area ≤ ±3%.

Gas intake
Three intake gas paths with mass flow controllers (Ar, O2 and one N2 path); three channels feed the chamber through a CF16 ultra-high vacuum shut-off valve.

Coating power supplies

• RF power supply: 500 W with automatic matching (made in China).
• DC power supply: 1000 W (made in China).

Vacuum pumps & valves

• Turbomolecular pump: FF-160/620 (water-cooled) — 1 set.
• Mechanical pump: 8 L/s — 1 set.
• Vacuum main valve: stainless steel GV150 — 1 set.
• Pipeline: DN40 metal corrugated piping and KF40 angle valves as required.
• Digital composite vacuum gauge: model ZDF-5227 — 1 set.

System control & electrical

• Power supply: 380 V / 50 Hz three-phase five-wire with leakage protection; equipment and control cabinets must be grounded; typical system power ~5 kW.
• Two standard power/control cabinets housing main PSU, digital vacuum gauge, substrate heater controller, rack drive power, chamber lighting, turbomolecular pump power, RF and DC coating supplies.

Configuration list (selected)

• Vacuum chamber (Φ450 × H460 mm), upper cover, SUS304 stainless steel — Set ×1 — Manufacturer: DEXINMAG
• Observation window (side, Φ100 mm) — EA ×2 — DEXINMAG
• Turbomolecular pump (FF-160/620, water-cooled) — Set ×1 — Made in China
• Mechanical pump (8 L/s) — Set ×1 — Made in China
• Vacuum main valve GV150 (stainless steel) — Set ×1 — DEXINMAG
• Digital composite vacuum gauge (ZDF-5227) — Set ×1 — Made in China
• Gas Mass Flow Controller (D07-7, 3-way MFC) — Set ×1 — Made in China
• Magnetron sputtering targets (4 inches, water-cooled) — Set ×2 — DEXINMAG
• Substrate table Φ150 mm, heated to 500 ℃, self-rotating, bias capable — Set ×1 — DEXINMAG
• RF power supply 500 W (auto-match) — Set ×1 — Made in China
• DC power supply 1000 W — Set ×1 — Made in China

Spare / consumable highlights

• O-rings (fluoro rubber), copper rings (CF sizes CF16–CF200) and standard stainless fasteners supplied by DEXINMAG as spare parts.
• Glass lining tubes, baking lamps, furnace wire, fuses and pneumatic fittings included in spare list.

End-user preparation & site requirements
End users must provide laboratory utilities (cooling water, power, compressed air), substrates and target materials and working gases (high-purity argon, etc.).

• Equipment footprint: 2.0 m (L) × 1.5 m (W); recommended minimum room: 3.5 m × 3.5 m × 2.4 m (H). Lab entrance ideally ≥ 1.85 m (H) × 0.95 m (W); solid non-corrosive floor; clean environment without corrosive dust/gases.
• Ambient: 10 ℃ – 30 ℃; humidity ≤ 70%.
• Power: ~5 kW, 380 V three-phase five-wire with grounding.
• Cooling water: inlet temperature ≤ 20 ℃; inlet pressure 0.2–0.3 MPa; flow ≥ 0.8 m3/h.
• Mechanical pump exhaust requires an exhaust pipe.

Technical specifications

• Model: DXMS-450C.
• Chamber size: Φ450 mm × H460 mm; material: SUS304 stainless steel.
• Turbomolecular pump: FF-160/620 (water-cooled); mechanical pump: 8 L/s.
• Ultimate vacuum: better than 8×10^-5 Pa.
• Observation windows: Φ100 mm ×2 with manual baffles.
• Substrate table: Φ150 mm; heating ≥ 500 ℃; rotation 2–10 rpm; bias 0–200 V.
• Targets: two 4-inch water-cooled magnetron targets (RF & DC compatible).
• Coating power: RF 500 W (auto-matching), DC 1000 W.
• Coating uniformity: ≤ ±5% (5-inch area); ≤ ±3% (2-inch area).
• Gas control: 3-channel MFC (Ar, O2, N2) feeding via CF16 valve.
• Electrical supply: 380 V / 50 Hz three-phase; recommended system power ~5 kW.
• Cooling water requirement: inlet ≤ 20 ℃, pressure 0.2–0.3 MPa, flow ≥ 0.8 m3/h.