- Industrial machines and equipment
- Surface Treatment Equipment
- Vacuum coating machine
- Xiamen Dexing Magnet Tech. Co., Ltd.
Small batch vacuum coating machine DXP-300
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Characteristics
- Options
- for small batches
Description
Overview
Composition
Technical specifications
Applications
Options and configuration
- DXP-300 is a laboratory-scale PVD laser coating system for preparation of superconducting thin films, semiconductor films, ferroelectric films and other functional thin films.
- Intended for scientific research and small-batch thin-film preparation in universities and research institutions.
Composition
- Sputtering vacuum chamber
- Rotating target platform
- Antioxidative substrate heat plate
- Working air circuit and air-bleed system
- Installation machine
- Vacuum measurement system
- Electric control system
Technical specifications
- Model: DXP-300
- Main vacuum chamber: Sphere, Ø300 mm
- Vacuum system: Mechanical pump + molecular pump + slide valve
- Ultimate pressure: ≤6.67*10-5 Pa (after bake and degassing)
- Vacuum recovery: Reach 5*10-3 Pa in 20 mins (special procedure: brief air exposure, inflate dry chlorine, then begin exhaust)
- Rotating target platform: Target size Ø30 mm; up to 4 targets; each target can rotate; revolution change supported; rotating speed 5–60 rpm
- Substrate heat plate — sample size: 1 inch
- Substrate heat plate — motion: Continuous substrate rotation; revolving speed 5–60 rpm
- Maximum substrate temperature: 800℃ ±1℃
- Air circuit system: Single-channel mass flow controller
- Laser beam scanning device: Two-dimensional scanning mechanical stage (two-axis scanning)
- Computer control system: Controls target plate revolution, target rotation, sample rotation and temperature, laser scanning and related functions
- Floor space — Mainframe: 850 × 850 mm²
- Floor space — Electric control cabinet: 700 × 700 mm² (1 set)
Applications
- Thin-film material research: superconductors, semiconductors, ferroelectrics and functional oxide films
- Small-batch sample preparation for R&D and academic experiments
- Process development and parameter optimization for lab-scale production
Options and configuration
- Custom target arrangements and target materials
- Sample holders and fixtures for various substrate sizes
- Vacuum and filtration accessories, additional mass flow channels upon request
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Vacuum Equipment
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