Vacuum coating machine DXD-450

The DXD-450 is a single-chamber thermal evaporation vacuum coating system designed for depositing metal, semiconductor, oxide and organic thin films for research, technology development and pre-production testing.

Composition

• Organic / metal source evaporation chamber
• Vacuum exhaust system
• Vacuum measurement system
• Evaporation source(s)
• Sample heating and temperature control
• Electronic control system
• Distribution system

Technical Index

• Model: DXD-450
• Main vacuum chamber: square chamber, size 400 × 400 × 400 mm
• Vacuum system configuration: mechanical pump, molecular pump, slide valve
• Ultimate pressure: ≤ 6×10⁻⁵ Pa
• Pump‑down / recovery: reaches 9×10⁻⁴ Pa in 40 minutes (after short exposure to air and inflate dry chlorine then begin air exhaust)
• Substrate heat plate:
  • Sample size: 120 × 120 mm, 1 piece
  • Motion: vertical travel 0–50 mm; continuous rotation, speed 5–30 rpm
  • Maximum substrate temperature: 800℃ ±1℃; distance to evaporation source: 250–300 mm
• Organic resistance evaporation source:
  • Crucible capacity: ≥ 2 cc
  • Temperature range: RT–500℃, continuous and adjustable
  • Power: current 300 A, max output 3 kW
  • Water‑cooled electrodes: 4 pieces, configurable as 2 evaporation boats
• Quartz crystal film thickness controller: thickness monitoring range 0–99μ9999 Å
• Air circuit system: mass flow controller, 1 channel
• Laser beam scanning device: two‑dimensional scanning mechanical stage for bidirectional scanning
• Computer control system: controls target revolution, target rotation, sample rotation, sample temperature, laser scanning and related functions
• Floor space:
  • Mainframe footprint: 2450 × 1250 mm² (independent rack 770 × 600 mm²); glovebox size match 1830 × 750 mm²
  • Electric control cabinet: 700 × 700 mm² (1 set)

Characteristics / Technical specifications

• Model: DXD-450
• Chamber size: 400 × 400 × 400 mm
• Ultimate vacuum: ≤ 6×10⁻⁵ Pa
• Substrate max temperature: 800℃ ±1℃
• Sample plate: 120 × 120 mm (single piece), rotation 5–30 rpm, vertical travel 0–50 mm
• Evaporation distance: 250–300 mm
• Evaporation crucible capacity: ≥ 2 cc; temperature range RT–500℃ (adjustable)
• Evaporation power supply: 300 A, max 3 kW
• Thickness monitoring: quartz crystal controller, range up to 99μ9999 Å
• Floor footprint (mainframe): 2450 × 1250 mm²; electric cabinet 700 × 700 mm²