- Industrial machines and equipment
- Surface Treatment Equipment
- Vacuum coating machine
- Xiamen Dexing Magnet Tech. Co., Ltd.
Vacuum coating machine DXALD
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Description
Overview
Technical index
Specifications
- The Single Atomic Layer Film Growing Equipment (DXALD) is an atomic layer deposition (ALD) system designed for precise, controllable thin-film growth of metals, oxides, carbides and a range of semiconductor or superconducting materials for research and teaching in colleges and scientific institutions.
- The system provides flexible test parameters, reliable operation and an easy-to-use human–machine interface to meet complex coating requirements in research and educational environments.
- DXALD is primarily used for dielectric films such as transparent conductive oxides and Al2O3; ZnO is given as a representative deposited material.
Technical index
- Ultimate vacuum: 5 Pa
- Whole vacuum leak rate: < 10^-8 Pa·L/s
- Vacuum chamber:
- Vacuum cavity: vacuum cavity
- Vacuum material / structure: argon arc welded stainless steel with removable top cover
- Bottom exhaust port: connects to vacuum dry pump
- Substrate heater: external heating system, temperature range room temperature to 500 °C, continuous and adjustable
- Size of substrate: Ø 50–100 mm
- Uniformity of film thickness: for Ø 100 mm ZnO film, thickness uniformity < ±1%
- ALD gas transport / gas circuits:
- Liquid precursor circuit: customized
- Gas precursor circuit: customized
- Vacuum exhaust system:
- Bilateral oil-free dry vacuum pump: 1 set
- Vacuum pipeline: 1 set
- Vacuum monitor: Pirani gauge — measuring range: 1.0×10^-5 Pa to 1×10^-2 Pa
- Data collection and HMI: 1 set
- Computer control / power supplies and controls:
- Sample heating power supply: 1 set
- Magnetic exchange valve: 1 set
- Main control power supply: 1 set
- Installation frame: welded steel, quick-release mask; casters can be fixed or moved
- Equipment size (L×W×H): 600 × 600 × 1200 mm
Specifications
- Model series: DXALD (Single Atomic Layer Film Growing Equipment)
- Ultimate vacuum capability: 5 Pa
- Leak rate: < 10^-8 Pa·L/s
- Supported substrate size: Ø 50–100 mm
- Substrate heater range: room temperature to 500 °C (continuous, adjustable)
- Vacuum exhaust: oil-free dry vacuum pump (1 set)
- Typical footprint: 600 × 600 × 1200 mm
- Example target film and uniformity: ZnO on Ø 100 mm, thickness uniformity < ±1%
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Vacuum Equipment
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