Magnetron sputtering machine DXJ-450D

for metallization

The Single-chamber Magnetron Sputtering System DXJ-450D is intended for research and small-batch production of advanced nanoscale mono- and multilayer thin films, including hard coatings, metal, semiconductor and dielectric films, suitable for universities and research institutes.

Composition

• The system mainly consists of a sputtering vacuum chamber, magnetron sputtering targets, a water-cooled substrate heating plate, working gas circuit, pumping system, vacuum measurement, electronic control system and installation cabinet.

Technical index

• Model: DXJ-450D
• Vacuum chamber size: cylindrical chamber Ø450 × 350 mm
• Vacuum system configuration: compound molecular pump, mechanical pump, slide valve
• Ultimate pressure: ≤ 6.67×10⁻⁵ Pa (after bake and degassing)
• Vacuum recovery time: reaches 6.6×10⁻⁴ Pa in 40 min (after short air exposure and dry chlorine purge before pump-down)
• Permanent magnetron targets: three permanent targets, target diameter Ø60 mm (one can sputter magnetic material); RF and DC compatible; all three targets can be tilted above sample center; target-to-sample distance adjustable 90–110 mm (upward sputtering 40–80 mm)
• Substrate system: single water-cooled substrate heating plate with independent heating and cooling; heating furnace removable to install water-cooled plate
• Sample size: Ø30 mm
• Motion mode: continuous substrate rotation; rotation speed 5–10 rpm
• Substrate heating: maximum 600°C ±1°C
• Negative substrate bias: -200 V
• Gas circuit: mass flow controllers, 2 channels
• Computer control: controls sample rotation, baffle switching, target position confirmation, etc.
• Optional accessories: 6-station substrate rotation plate (replaces removable single water-cooled/heating plate; supports six Ø30 mm substrates; one station for heating furnace; others for water-cooled or natural cooling; MAX substrate temp 600°C ±1°C)
• Footprint — mainframe: 1300 × 800 mm²
• Footprint — electric control cabinet: 700 × 700 mm² (2 sets)

Technical specifications

• Intended use: preparation of nanoscale mono-/multilayer functional films (hard, metal, semiconductor, dielectric)
• Model: DXJ-450D
• Chamber external size: Ø450 × 350 mm
• Ultimate vacuum: ≤ 6.67×10⁻⁵ Pa (post-bake)
• Standard pumping: compound molecular pump + mechanical pump with slide valve
• Targets: three permanent magnetron targets Ø60 mm, RF and DC compatible
• Substrate handling: single removable water-cooled heating plate; sample Ø30 mm; rotation 5–10 rpm; heating up to 600°C ±1°C; negative bias -200 V
• Gas control: 2-channel mass flow controllers
• Control: computerized control for rotation, baffle switching and target positioning
• Footprint: mainframe 1300 × 800 mm²; control cabinets 700 × 700 mm² (two sets)