Atomic emission spectrometer ICP-8100
optical emissioninductively coupled plasmaICP-OES

Atomic emission spectrometer - ICP-8100 - Labfreez Instruments Group Co., Ltd - optical emission / inductively coupled plasma / ICP-OES
Atomic emission spectrometer - ICP-8100 - Labfreez Instruments Group Co., Ltd - optical emission / inductively coupled plasma / ICP-OES
Atomic emission spectrometer - ICP-8100 - Labfreez Instruments Group Co., Ltd - optical emission / inductively coupled plasma / ICP-OES - image - 2
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Characteristics

Type
atomic emission, optical emission, inductively coupled plasma, ICP-OES
Domain
for elemental analysis, for spectroscopy, for mobile machines, for industrial applications, for laboratory
Configuration
benchtop
Detector type
PMT
Other characteristics
grating, full-spectrum, high-sensitivity, high-precision

Description

Short description
The ICP-8100 inductively coupled plasma emission spectrometer performs quantitative and qualitative analysis of metal and selected non-metal elements in liquid samples and in solids converted to solution. Designed for industrial and laboratory elemental analysis with ppb-level detection limits and multi-element throughput.

Working principle
The instrument atomizes and excites sample aerosols in an argon plasma; emitted characteristic wavelengths are dispersed and detected to determine element concentrations.

Instrument overall performance index
  • Wavelength range: 180–800 nm (2400 lines/mm) or 180–500 nm (3600 lines/mm)
  • Resolution: ≤0.006 nm (full band)
  • Wavelength accuracy: ≤0.02 nm; repeatability ≤0.003 nm
  • Scan step: 0.0004 nm
  • Precision (RSD): ≤1.50%; Stability (RSD): ≤2%
  • Detection limit: ppb level
  • Elements: all elements except C, S and certain light non-metallics and some radioactive metals
  • Linear range: ≥7 orders of magnitude
  • Analysis speed: ≥25 elements/min
  • Certificates: National measurement equipment Class A


Main parts detailed parameters
Radio frequency generator (RF)
Circuit type: self-excited oscillation inductance feedback
Output power: 800–1200 W
Working frequency: 40.68 MHz ±0.05%
Output power stability: ≤0.3%
Frequency stability: <0.1%
EM field leakage: at 30 cm E < 1 V/m

Injection Device
Output coil inner diameter: 25 mm, 3 turns
Torch: three-concentric quartz torch, outer diameter 20 mm
Coaxial nebulizer: outer diameter 6 mm (customizable)
Spray chamber (binocular): outer diameter 34 mm (customizable)
Observation position: vertical

Argon gas flow meters and gas carrier pressure gauges Specifications
Plasma gas flow: 100–1000 L/h (1.6–16 L/min)
Auxiliary gas flow: 1–100 L/h (0.16–1.66 L/min)
Carrier gas flow: 10–100 L/h (0.16–1.66 L/min)
Carrier gas regulator: 0–0.4 MPa
Cooling water: 15–25 °C; flow > 5 L/min; pressure > 0.1 MPa; resistivity > 1 MΩ

Splitter
Optical layout: Czerny–Turner
Scan step: 0.0004 nm
Focal length: 1000 mm
Exit/entrance slit: 20 μm × 25 μm
Grating: ion-etched holographic; options 3600 or 2400 lines/mm (80 × 110 mm)
Reciprocal linear dispersion: 0.26 nm/mm
Resolution: ≤0.006 nm (full band)
Thermostat: 26 °C ±1 °C
Scan range: 180–500 nm (3600 l/mm) or 180–800 nm (2400 l/mm)

Metering Device
Photomultiplier: R212UH or R928
High voltage: 0–1000 V automatic, stability < 0.05%
Current range: 10^-12 – 10^-4 A (optional)
Sampling circuit: high-precision op-amp for sensitivity and accuracy
Data acquisition: PC connection via serial port
Measurement mode: single and multi-element sequential, single-pass scan
Signal conversion V/F: 1 mV = 100 Hz

Main features and software functions
  • Optimized optical system and advanced control for high signal-to-background ratio
  • Imported key components for accuracy and sensitivity
  • Minimal matrix effects; ~99% samples may not require matrix separation
  • Wide dynamic range from ultra-trace to high concentration
  • Multi-element capability: ~72 metal elements plus selected non-metals
  • Qualitative and quantitative analysis modes
  • Windows-based analysis software in Chinese and English with flexible output and printing


Unique software advantages
Proprietary multi-window analysis software with company logo; supports standard addition, single-point/multi-point modes, Gaussian fitting, multitasking; preset rapid analysis modes; supports printers and multiple output formats.

Customer advantages
Manufacturer experience since 2000 with domestic and international customers; delivers high-precision, high-sensitivity and stable plasma emission spectrometers for laboratory and industrial use.

Technical specifications
  • Model: ICP-8100
  • Wavelength range: 180–800 nm (2400 lines/mm) or 180–500 nm (3600 lines/mm)
  • Resolution: ≤0.006 nm (full band)
  • Wavelength accuracy: ≤0.02 nm; repeatability ≤0.003 nm
  • Scan step: 0.0004 nm
  • Precision (RSD): ≤1.50%; Stability (RSD): ≤2%
  • Detection limit: ppb level
  • Elements: all elements except C, S and certain light non-metallics or some radioactive metals
  • Analysis speed: ≥25 elements/min
  • RF output power: 800–1200 W; frequency 40.68 MHz ±0.05%
  • Photomultiplier: R212UH or R928; HV 0–1000 V
  • Cooling water: 15–25 °C; flow > 5 L/min; pressure > 0.1 MPa; resistivity > 1 MΩ
  • Software: Windows-based, Chinese/English, multi-window analysis

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