Infrared photodiode C30737LH-500-83N
avalanchesiliconwavelength-sensitive

Infrared photodiode - C30737LH-500-83N - Excelitas Technologies - PCO - avalanche / silicon / wavelength-sensitive
Infrared photodiode - C30737LH-500-83N - Excelitas Technologies - PCO - avalanche / silicon / wavelength-sensitive
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Characteristics

Type
infrared, avalanche, silicon, wavelength-sensitive, LIDAR

Description

Product Overview
The C30737LH-500-83N Silicon Avalanche Photodiode (Si APD) features a 500 µm active diameter with enhanced response at 800 nm and a 650 nm optical bandpass filter. Supplied in a leadless ceramic carrier (LCC) option 'LH', it is intended for compact OEM integration where narrowband sensitivity and fast temporal response are required.

Key Features
  • High responsivity with integrated 650 nm bandpass filter
  • Low noise and fast rise time across wavelengths; frequency response above 1.3 GHz
  • Large 500 µm active diameter optimized for near-infrared operation (800 nm)
  • Leadless ceramic carrier (LCC) option 'LH' for compact mounting
  • Gain ~100 at 650 nm, high responsivity (35 A/W at 650 nm)

Applications
  • LiDAR and time-of-flight sensing
  • Laser range finding and telemetry
  • Security and scanning systems
  • OEM detectors for cost-sensitive, high-performance photon detection

Technical specifications
  • Active diameter: 500 µm
  • Peak sensitivity wavelength: 650 nm
  • Breakdown voltage Vbd: 120–210 V (binning available)
  • Temperature coefficient of Vop for constant M: 0.5 V/°C
  • Gain: 100 @ 650 nm
  • Responsivity: 35 A/W at 650 nm
  • Dark current Id: <1 nA (typ. 0.1 nA)
  • Noise current: 0.1 pA/√Hz
  • Capacitance: 2 pF
  • Rise/Fall time: 0.3 ns (Rload = 50 Ω)
  • Cut-off frequency: 1.3 GHz
  • Storage temperature: -50 °C to +100 °C
  • Operating temperature: -40 °C to +85 °C
  • Package: 3 × 3 mm glass window, leadless ceramic carrier (LCC)
  • Window: 650 nm filter

Catalogs

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Exhibitions

Meet this supplier at the following exhibition(s):

electronica Munich 2026
electronica Munich 2026

10-13 Nov 2026 Munich (Germany) Hall B4 - Stand 302

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